Jung-Chang Lu

Title: Innovations of Jung-Chang Lu

Introduction

Jung-Chang Lu is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of non-volatile memory technology. With a total of five patents to his name, his work has had a considerable impact on the industry.

Latest Patents

One of his latest patents is titled "Non-volatile memory unit and method for manufacturing the same." This invention discloses a non-volatile memory unit that includes a substrate with a source region and a drain region. A first dielectric layer is formed on the substrate, and an erase gate, a floating gate, and a coupled control gate are formed on this first dielectric layer. Additionally, a second dielectric layer and a coupled dielectric layer are formed among and above the erase gate, the floating gate, and the selective gate, as well as on the coupled control gate of the coupled dielectric layer.

Career Highlights

Jung-Chang Lu is currently employed at Xinnova Technology Limited, where he continues to innovate in the field of memory technology. His expertise and dedication have led to advancements that benefit both the company and the broader technology sector.

Collaborations

He has collaborated with notable colleagues, including Der-Tsyr Fan and Chih-Ming Chen, who have contributed to his research and development efforts.

Conclusion

Jung-Chang Lu's work in non-volatile memory technology exemplifies the spirit of innovation. His patents and collaborations highlight his commitment to advancing technology in meaningful ways.