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For the Inventor, By the Inventor

Kumamoto, Japan

Jun Nonaka

USPTO Granted Patents = 16 

Average Co-Inventor Count = 2.1

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Koshi-Shi, JP (2018)
  • Koshi, JP (2020 - 2023)
  • Kumamoto, JP (2015 - 2024)

Company Filing History:

goldMedal16 out of 10,326 
 
Tokyo Electron Limited
 patents

Years Active: 2015-2025

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16 patents (USPTO):Explore Patents
1. 12255082 - Substrate processing method (2025-03-18),
2. 12198948 - Substrate processing apparatus (2025-01-14),
3. 12068175 - Substrate processing apparatus, mixing method, and substrate processing method (2024-08-20),
4. 12033872 - Substrate processing apparatus and substrate processing method (2024-07-09),
5. 11938524 - Substrate processing apparatus and substrate processing method (2024-03-26),
6. 11724235 - Mixing apparatus, mixing method and substrate processing system (2023-08-15),
7. 11723259 - Substrate processing apparatus and method of processing substrate (2023-08-08),
8. 11282727 - Control device of substrate processing apparatus and control method of substrate processing apparatus (2022-03-22),
9. 11257692 - Substrate processing apparatus, mixing method, and substrate processing method (2022-02-22),
10. 10748790 - Substrate processing apparatus and substrate processing method (2020-08-18),
11. 10242889 - Substrate liquid processing method and substrate liquid processing apparatus (2019-03-26),
12. 10236192 - Liquid processing apparatus, liquid processing method, and storage medium (2019-03-19),
13. 9897919 - Substrate liquid treatment apparatus, substrate liquid treatment method and storage medium (2018-02-20),
14. 9862007 - Substrate liquid processing apparatus and method, and computer-readable recording medium with substrate liquid processing program recorded therein (2018-01-09),
15. 9412627 - Liquid processing method and liquid processing apparatus (2016-08-09),

Title: Innovations by Jun Nonaka

Introduction

Jun Nonaka is a prominent inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate processing, holding a total of 16 patents. His work focuses on improving methods and apparatuses for substrate processing, which are essential in various technological applications.

Latest Patents

Among his latest patents is a substrate processing method that involves arranging multiple substrates in a chamber's storage area. This method supplies an organic solvent to the substrates and utilizes a hydrophobizing agent to enhance their properties. Another notable patent is a substrate processing apparatus that includes a gastight chamber designed to accommodate multiple substrates. This apparatus features a holding unit that can lift or lower the substrates between a storage area and a drying area, optimizing the processing efficiency.

Career Highlights

Jun Nonaka is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His innovative approaches have contributed to advancements in substrate processing technologies, making him a valuable asset to his organization.

Collaborations

He has collaborated with notable coworkers, including Takashi Yabuta and Takao Inada, who have also contributed to the field of substrate processing.

Conclusion

Jun Nonaka's work exemplifies the spirit of innovation in substrate processing technology. His patents and contributions continue to influence advancements in the industry.

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