The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2019
Filed:
Nov. 20, 2014
Tokyo Electron Limited, Tokyo, JP;
Jun Nonaka, Kumamoto, JP;
Shogo Mizota, Kumamoto, JP;
Tatsuya Nagamatsu, Beaverton, OR (US);
Daisuke Saiki, Kumamoto, JP;
Kazuhiro Teraoka, Kumamoto, JP;
Takashi Yabuta, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A liquid processing apparatus of the present disclosure holds and rotate a substrate in a substrate holding unit, ejects an etching liquid while moving a main nozzle of a main nozzle unit between a first position where the etching liquid reaches a center of the substrate and a second position closer to a peripheral side of the substrate than the first position, and then, ejects the etching liquid to the substrate from a sub nozzle provided at a third position closer to the peripheral side of the substrate than the first position at an ejection flow rate higher than that from the main nozzle.