Company Filing History:
7 out of 916 
2 out of 399 
2 out of 13,684 
Years Active: 2001-2023
Title: Innovations of Inventor Jun Lu
Introduction
Jun Lu is a prominent inventor based in Beverly, MA (US), known for his significant contributions to the field of ion implantation systems. With a total of 11 patents to his name, he has made remarkable advancements in technology that enhance the efficiency and effectiveness of ion beam applications.
Latest Patents
Among his latest patents is the "Dual XY variable aperture in an ion implantation system." This invention features an aperture diaphragm capable of varying the size of an aperture in two dimensions. The diaphragm can be utilized in an ion implantation system, specifically between the mass analyzer and the acceleration column. This innovation allows for the control of various parameters of the ion beam, including angular spread in both height and width directions, beam current, and cross-sectional area. Additionally, he has developed an "Apparatus, system and method for energy spread ion beam." This ion implanter includes an ion source that generates a continuous ion beam, a DC acceleration system, and an AC linear accelerator that outputs a bunched ion beam. The energy spreading electrode assembly applies an RF voltage to enhance the performance of the bunched ion beam.
Career Highlights
Jun Lu has worked with notable companies in the semiconductor industry, including Varian Semiconductor Equipment Associates, Inc. and Axcelis Technologies, Inc. His experience in these organizations has contributed to his expertise in ion implantation technology and innovation.
Collaborations
Throughout his career, Jun Lu has collaborated with esteemed colleagues such as Frank Sinclair and Bon-Woong Koo. These partnerships have fostered a collaborative environment that has led to significant advancements in their field.
Conclusion
Jun Lu's innovative work in ion implantation systems has established him as a key figure in the industry. His patents reflect a commitment to enhancing technology and improving ion beam applications. His contributions continue to influence the field and inspire future innovations.
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