The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2023

Filed:

Apr. 02, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Paul J. Murphy, Reading, MA (US);

Frank Sinclair, Boston, MA (US);

Jun Lu, Beverly, MA (US);

Daniel Tieger, Manchester, MA (US);

Anthony Renau, West Newbury, MA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01); H01J 37/317 (2006.01); H01J 37/304 (2006.01); H01J 37/32 (2006.01); H01J 37/05 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3171 (2013.01); H01J 37/05 (2013.01); H01J 37/08 (2013.01); H01J 37/304 (2013.01); H01J 37/32082 (2013.01); H01J 2237/24585 (2013.01);
Abstract

An ion implanter may include an ion source, arranged to generate a continuous ion beam, a DC acceleration system, to accelerate the continuous ion beam, as well as an AC linear accelerator to receive the continuous ion beam and to output a bunched ion beam. The ion implanter may also include an energy spreading electrode assembly, to receive the bunched ion beam and to apply an RF voltage between a plurality of electrodes of the energy spreading electrode assembly, along a local direction of propagation of the bunched ion beam.


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