Jui-Hei Huang

Title: Jui-Hei Huang: Innovator in Isolation Structure Fabrication

Introduction

Jui-Hei Huang is a notable inventor based in Yongkang, Taiwan. He has made significant contributions to the field of integrated circuit fabrication, particularly in the development of isolation structures. With a total of 3 patents to his name, Huang's work is recognized for its innovative approaches and technical precision.

Latest Patents

Huang's latest patents focus on methods for fabricating isolation structures. One of his notable inventions involves a method that includes forming a trench in a substrate and partially filling it with a pure oxide. This process utilizes silane and oxygen precursors at low pressure and high temperatures, resulting in a solid reaction product that is sublimated and removed efficiently. Another patent emphasizes the creation of an isolation structure with minimal voids, achieved through a series of precise steps involving silicon oxide and specific vapor mixtures.

Career Highlights

Huang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the reliability and performance of electronic devices.

Collaborations

Huang collaborates with esteemed colleagues, including Tze-Liang Lee and Pei-Ren Jeng, who contribute to the innovative environment at their workplace.

Conclusion

Jui-Hei Huang's contributions to the field of semiconductor fabrication are noteworthy. His innovative methods for creating isolation structures demonstrate his commitment to advancing technology in the electronics industry.