Jui Fu Chueh

Title: Jui Fu Chueh: Innovator in Semiconductor Manufacturing

Introduction

Jui Fu Chueh is a notable inventor based in Taipei, Taiwan. She has made significant contributions to the field of semiconductor manufacturing. Her innovative methods have paved the way for advancements in this critical technology sector.

Latest Patents

Jui Fu Chueh holds a patent for a "Method of manufacturing semiconductor devices and semiconductor devices." This patent outlines a process where a gate space is formed by removing a sacrificial gate electrode over a channel region. A first gate dielectric layer is then formed over the channel region in the gate space, followed by the formation of a second gate dielectric layer over the first. The method includes the formation of one or more conductive layers on the second gate dielectric layer, which are subsequently recessed. An annealing operation is performed to diffuse an element of the second gate dielectric layer into the first gate dielectric layer, culminating in the formation of one or more metal layers in the gate space. This innovative approach enhances the efficiency and performance of semiconductor devices.

Career Highlights

Jui Fu Chueh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. Her work has been instrumental in developing advanced manufacturing techniques that are essential for modern electronics.

Collaborations

Throughout her career, Jui Fu Chueh has collaborated with esteemed colleagues, including Yung-Hsiang Chan and An-Hung Tai. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Jui Fu Chueh's contributions to semiconductor manufacturing exemplify her dedication to innovation in technology. Her patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight her role as a key player in advancing semiconductor technology.