Company Filing History:
Years Active: 2002-2012
Title: Judy Wang: Innovator in Plasma Etching Technology
Introduction
Judy Wang is a prominent inventor based in Cupertino, CA, known for her significant contributions to the field of plasma etching technology. With a total of 6 patents to her name, she has made remarkable advancements that enhance the efficiency and precision of etching processes in semiconductor manufacturing.
Latest Patents
Wang's latest patents include innovative methods for plasma etching carbonaceous layers using sulfur-based etchants. One of her notable inventions involves etching carbonaceous layers with a gas mixture that includes molecular oxygen and a carbon sulfur terminal ligand. This method employs a high RF frequency source to achieve a high etch rate while maintaining selectivity to inorganic dielectric layers. Additionally, her work describes an etch process that allows for controlled critical dimension shrinkage. This involves using a multi-layered mask with a lithographically patterned photoresist and an unpatterned organic antireflective coating (BARC) to etch openings in substrate layers with reduced critical dimensions.
Career Highlights
Judy Wang is currently employed at Applied Materials, Inc., where she continues to push the boundaries of plasma etching technology. Her expertise and innovative approaches have positioned her as a key player in the semiconductor industry.
Collaborations
Throughout her career, Wang has collaborated with notable colleagues, including Shawming Ma and Bryan Y Pu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Judy Wang's contributions to plasma etching technology exemplify her dedication to innovation and excellence in the semiconductor field. Her patents reflect her commitment to advancing manufacturing processes, making her a significant figure in the industry.