This inventor holds 3 USPTO granted patents. Top assignee: Win Semiconductors Corp.. Active years: 2021-2024.
Company Filing History:
Years Active: 2021-2024
Title: Ju-Hsien Lin: Innovator in Semiconductor Technology
Introduction
Ju-Hsien Lin is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative semiconductor structures that enhance device performance and reliability.
Latest Patents
Ju-Hsien Lin's latest patents include advanced semiconductor structures. One of his notable inventions describes a semiconductor structure that comprises a substrate, an active device, and a passive device positioned over the substrate. The active device is located in a first region, while the passive device is situated in a second region. This structure also features a shielding structure and a passivation layer. The shielding structure consists of a barrier layer and a ceiling layer, with the barrier layer covering both the active and passive devices. The passivation layer is strategically placed beneath the barrier layer, covering the top surface of the passive device. An air cavity is defined by the sidewalls of the barrier layer, the bottom surface of the ceiling layer, and the substrate.
Another patent by Lin outlines a similar semiconductor structure, which includes a substrate, a passive device, and an active device. In this design, the active device is formed in the first region of the substrate, while the passive device is formed in the second region. The passivation layer in this structure also covers the top surface of the passive device and features an opening that exposes the active device.
Career Highlights
Ju-Hsien Lin is currently employed at Win Semiconductors Corp., where he continues to innovate in the semiconductor field. His work has been instrumental in advancing semiconductor technology, making significant impacts on the industry.
Collaborations
Throughout his career, Ju-Hsien Lin has collaborated with notable colleagues, including Jung-Tao Chung and Shu-Hsiao Tsai. These collaborations have further enriched his contributions to semiconductor innovations.
Conclusion
Ju-Hsien Lin stands out as a key figure in semiconductor technology, with a focus on developing advanced structures that improve device functionality. His patents reflect a commitment to innovation and excellence in the field.