Jou-Hsuan Lu

Title: Jou-Hsuan Lu: Innovator in EUV Photolithography Technology

Introduction

Jou-Hsuan Lu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photolithography, particularly in the development of extreme ultraviolet (EUV) technology. With a total of 3 patents to his name, Lu's work has had a substantial impact on the semiconductor manufacturing industry.

Latest Patents

One of Lu's latest patents focuses on an EUV photolithography system fuel source and methods of operating the same. This innovation addresses the removal of impurities in a liquefied solid fuel utilized in a droplet generator of an EUV photolithography system. By eliminating these impurities, the stability and predictability of droplet formation are enhanced, which positively affects wafer yield and extends the droplet generator's lifetime. Another notable patent is for a droplet generator assembly and method of replacing components. This modularized vessel droplet generator assembly includes a droplet generator assembly (DGA) that efficiently manages the operation and service pathways for liquid fuel, ensuring optimal performance during the photolithography process.

Career Highlights

Jou-Hsuan Lu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at TSMC has positioned him as a key contributor to advancements in photolithography technology.

Collaborations

Lu collaborates with talented individuals in his field, including Cheng-Hao Lai and Ming-Hsun Tsai. These partnerships foster innovation and drive progress in semiconductor manufacturing technologies.

Conclusion

Jou-Hsuan Lu's contributions to EUV photolithography technology exemplify the importance of innovation in the semiconductor industry. His patents reflect a commitment to enhancing manufacturing processes and improving product quality.