Joseph Petrucci

Title: Joseph Petrucci: Innovator in Semiconductor Technology

Introduction

Joseph Petrucci is a notable inventor based in New Milford, CT (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to solving complex engineering challenges.

Latest Patents

One of his latest patents is titled "Method for defining alignment marks in a semiconductor wafer." This patent describes a lithography and etching method for forming alignment marks and at least one device feature, such as a shallow trench, on a wafer. The etching process involves a first etching step for pre-defining at least one alignment mark and a second etching step for defining desired semiconductor device patterns on the wafer surface. Another significant patent is "Semiconductor structure and method for reducing charge damage." This patent discloses a method for reducing charge damage during plasma etch processing, providing structures for accumulating charge on a semiconductor wafer that are electrically connected to device structures.

Career Highlights

Throughout his career, Joseph Petrucci has worked with prominent companies in the semiconductor industry, including Freescale Semiconductor, Inc. and Motorola Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor processing.

Collaborations

Joseph has collaborated with several talented individuals in his field, including John George Maltabes and Alain Bernhard Charles. These collaborations have contributed to the advancement of semiconductor technologies and have fostered a spirit of innovation.

Conclusion

Joseph Petrucci's contributions to semiconductor technology through his patents and career experiences highlight his role as a significant innovator in the industry. His work continues to influence the development of advanced semiconductor processes and technologies.