The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2004
Filed:
Apr. 27, 2001
Applicant:
Inventors:
Joseph Petrucci, New Milford, CT (US);
John Maltabes, Austin, TX (US);
Karl Mautz, Austin, TX (US);
Alain Charles, Singapore, SG;
Assignee:
Motorola, Inc., Schaumburg, IL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/176 ;
U.S. Cl.
CPC ...
H01L 2/176 ;
Abstract
A semiconductor method for reducing charge damage during plasma etch processing is disclosed. Structures ( ) for accumulating charge during plasma etch processing are provided on a semiconductor wafer ( ), the structures ( ) being electrically connected to device structures ( ).