Austin, TX, United States of America

Joseph Michael Imhof

USPTO Granted Patents = 3 

 

Average Co-Inventor Count = 4.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015-2025

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3 patents (USPTO):Explore Patents

Title: Joseph Michael Imhof: Innovator in Imprint Lithography

Introduction

Joseph Michael Imhof is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of imprint lithography, holding a total of 3 patents. His work focuses on enhancing the precision and efficiency of imprinting processes, which are crucial in various technological applications.

Latest Patents

One of his latest patents is titled "Managing multi-objective alignments for imprinting." This patent describes systems and methods for managing multi-objective alignments in imprinting, whether single-sided or double-sided. The system includes rollers for moving a template roll, a stage for holding a substrate, and a dispenser for dispensing resist on the substrate. It also features a light source for curing the resist to form an imprint on the substrate when a template is pressed into the resist. Additionally, it incorporates inspection systems for registering fiducial marks and determining offsets, along with a controller for adjusting the substrate's position based on these measurements.

Another significant patent is "Optically absorptive material for alignment marks." This invention involves imprint lithography templates that utilize alignment marks made from highly absorptive material. These marks are designed to be insensitive to the effects of liquid spreading, providing stability and increasing contrast during the liquid imprint filling of template features.

Career Highlights

Throughout his career, Joseph has worked with prominent companies in the field, including Canon Nanotechnologies, Inc. and Molecular Imprints, Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in imprint lithography technology.

Collaborations

Joseph has collaborated with several professionals in his field, including Kosta S. Selinidis and Dwayne L. LaBrake. These collaborations have further enriched his work and led to innovative solutions in imprint lithography.

Conclusion

Joseph Michael Imhof is a distinguished inventor whose work in imprint lithography has led to significant advancements in the field. His patents reflect his commitment to innovation and precision in technology. His contributions continue to influence the industry and inspire future developments.

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