The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2015
Filed:
Apr. 25, 2012
Applicants:
Niyaz Khusnatdinov, Round Rock, TX (US);
Kosta S. Selinidis, Ausin, TX (US);
Joseph Michael Imhof, Austin, TX (US);
Dwayne L. Labrake, Cedar Park, TX (US);
Inventors:
Niyaz Khusnatdinov, Round Rock, TX (US);
Kosta S. Selinidis, Ausin, TX (US);
Joseph Michael Imhof, Austin, TX (US);
Dwayne L. LaBrake, Cedar Park, TX (US);
Assignees:
Canon Nanotechnologies, Inc., Austin, TX (US);
Molecular Imprints, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/00 (2006.01); G03F 7/00 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 59/00 (2013.01); G03F 9/7042 (2013.01); G03F 9/7084 (2013.01);
Abstract
Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.