The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 20, 2015
Filed:
Sep. 26, 2011
Applicants:
Joseph Michael Imhof, Austin, TX (US);
Kosta S. Selinidis, Austin, TX (US);
Dwayne L. Labrake, Cedar Park, TX (US);
Inventors:
Joseph Michael Imhof, Austin, TX (US);
Kosta S. Selinidis, Austin, TX (US);
Dwayne L. LaBrake, Cedar Park, TX (US);
Assignee:
Canon Nanotechnologies, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
B82Y 40/00 (2013.01); G03G 7/0002 (2013.01);
Abstract
Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template.