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For the Inventor, By the Inventor

San Jose, CA, United States of America

Jose Antonio Marin

USPTO Granted Patents = 13 

Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 48(Granted Patents)


Location History:

  • Austin, TX (US) (1999)
  • San Jose, CA (US) (2013 - 2022)

Company Filing History:

goldMedal13 out of 13,741 
 
Applied Materials, Inc.
 patents

Years Active: 1999-2022

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13 patents (USPTO):Explore Patents
1. 11450509 - Inductive plasma source with metallic shower head using b-field concentrator (2022-09-20),
2. 10529541 - Inductive plasma source with metallic shower head using B-field concentrator (2020-01-07),
3. 10077508 - Multizone control of lamps in a conical lamphead using pyrometers (2018-09-18),
4. 9870919 - Process chamber having separate process gas and purge gas regions (2018-01-16),
5. 9685186 - HDD pattern implant system (2017-06-20),
6. 9580835 - Multizone control of lamps in a conical lamphead using pyrometers (2017-02-28),
7. 9230837 - Multizone control of lamps in a conical lamphead using pyrometers (2016-01-05),
8. 9117867 - Electrostatic chuck assembly (2015-08-25),
9. 8911554 - System for batch processing of magnetic media (2014-12-16),
10. 8772055 - Multizone control of lamps in a conical lamphead using pyrometers (2014-07-08),
11. 8546273 - Methods and apparatus for forming nitrogen-containing layers (2013-10-01),
12. 8481433 - Methods and apparatus for forming nitrogen-containing layers (2013-07-09),
13. 5883391 - Ion implantation apparatus and a method of monitoring high energy (1999-03-16),

Title: The Innovative Contributions of Jose Antonio Marin

Introduction

Jose Antonio Marin is a prominent inventor based in San Jose, CA. He has made significant contributions to the field of plasma processing, holding a total of 13 patents. His work has been instrumental in advancing technologies that utilize plasma for various applications.

Latest Patents

One of his latest patents is titled "Inductive plasma source with metallic shower head using b-field concentrator." This invention provides a method and apparatus for plasma processing of substrates. The processing chamber features a substrate support and a lid assembly facing the substrate support. The lid assembly includes a plasma source that comprises a coil disposed within a conductive plate, which may consist of nested conductive rings. The coil is designed to be substantially coplanar with the conductive plate and is insulated from it by an insulator that fits within a channel formed in the conductive plate or nests within the conductive rings. Additionally, a field concentrator is provided around the coil, insulated from it by isolators. The plasma source is supported by a conductive support plate, and a gas distributor supplies gas to the chamber through a central opening of the support plate and plasma source from a conduit disposed through the conductive plate.

Career Highlights

Jose Antonio Marin is currently employed at Applied Materials, Inc., where he continues to innovate and develop new technologies. His extensive experience in plasma processing has positioned him as a key figure in the industry.

Collaborations

Throughout his career, Marin has collaborated with notable colleagues, including Joseph Michael Ranish and Paul Brillhart. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Jose Antonio Marin's contributions to plasma processing technology are noteworthy and impactful. His patents and collaborations reflect his dedication to advancing the field. His work continues to influence the industry and inspire future innovations.

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