Jordan Plofsky

Title: The Innovative Contributions of Jordan Plofsky

Introduction

Jordan Plofsky is a notable inventor based in Sunnyvale, CA, who has made significant contributions to the field of integrated circuits. With a total of 9 patents to his name, Plofsky's work has advanced the technology used in semiconductor manufacturing.

Latest Patents

Among his latest patents, Plofsky has developed a mask set for fabricating integrated circuits. This mask set includes a first plurality of base layer masks, each containing a plurality of base layer tiles of a first tile size. Additionally, it features a first plurality of top layer masks and a second plurality of top layer masks, each with different tile sizes. This innovation enhances the efficiency of integrated circuit fabrication. Another significant patent involves systems that include an input/output (I/O) stack. This method allows for the independent development of I/O and integrated circuit dies, providing more space for I/O elements and accommodating new process generations.

Career Highlights

Jordan Plofsky is currently employed at Altera Corporation, where he continues to push the boundaries of technology in integrated circuits. His work has been instrumental in developing advanced semiconductor solutions that meet the demands of modern electronics.

Collaborations

Plofsky has collaborated with several talented individuals in his field, including Philippe Molson and Francois Pequillat. These partnerships have fostered innovation and contributed to the success of their projects.

Conclusion

Jordan Plofsky's contributions to the field of integrated circuits through his patents and work at Altera Corporation highlight his role as a leading inventor in technology. His innovative approaches continue to shape the future of semiconductor manufacturing.