The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 2014
Filed:
Sep. 27, 2011
Jordan Plofsky, San Jose, CA (US);
Chooi Pei Lim, Bayan Lepas, MY;
Danny Biran, Cupertino, CA (US);
Francis Man-chit Chow, Santa Clara, CA (US);
Jordan Plofsky, San Jose, CA (US);
Chooi Pei Lim, Bayan Lepas, MY;
Danny Biran, Cupertino, CA (US);
Francis Man-Chit Chow, Santa Clara, CA (US);
Altera Corporation, San Jose, CA (US);
Abstract
A mask set is described. In one implementation, the mask set includes: a first layer mask including a plurality of first tiles of a first tile size; and a second layer mask including a plurality of second tiles of a second tile size, where the second tile size is different from the first tile size. Also, a method of fabricating a plurality of integrated circuits (ICs) is described. In one implementation, the method includes: using a first layer mask having a first tile size to fabricate a first layer of a first IC of the plurality of ICs and a first layer of a second IC of the plurality of ICs; and using a second layer mask having a second tile size to fabricate a second layer of the first IC, where the second tile size is different from the first tile size.