Seoul, South Korea

Joon Lyou


Average Co-Inventor Count = 7.9

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2012-2015

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2 patents (USPTO):Explore Patents

Title: Joon Lyou: Innovator in Substrate Measurement and Photo Mask Repair

Introduction

Joon Lyou is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the fields of substrate measurement and photo mask repair, holding a total of 2 patents. His innovative work has advanced the reliability and efficiency of measurement techniques in various applications.

Latest Patents

Lyou's latest patents include a "Substrate Measurement Apparatus with Electron Distortion Unit." This fusion measurement apparatus enhances the reliability of measurements by utilizing an atomic microscope to measure surfaces at an atomic level, alongside an electron microscope for further analysis. The apparatus features an electrode that distorts the path of secondary electrons, directing them to an electron detector for improved measurement accuracy.

Another notable patent is the "Apparatus and Method for Repairing Photo Mask." This invention includes a repairing atomic force microscope designed to address defective portions of photo masks during the repair process. It is complemented by an electron microscope that navigates the repairing atomic force microscope to the defect and observes the repair process, as well as an imaging atomic microscope that captures the shape of the repaired photo mask in real-time.

Career Highlights

Throughout his career, Joon Lyou has worked with esteemed organizations such as the Korea Research Institute of Standards and Science and Nanofocus Inc. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking advancements in measurement technologies.

Collaborations

Lyou has collaborated with notable colleagues, including Byong Chon Park and Sang Jung Ahn. Their combined expertise has fostered an environment of innovation and creativity, leading to the development of impactful technologies.

Conclusion

Joon Lyou's contributions to substrate measurement and photo mask repair exemplify his dedication to innovation. His patents reflect a commitment to enhancing measurement reliability and efficiency in various scientific applications.

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