The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2015

Filed:

Jun. 24, 2011
Applicants:

Byong Chon Park, Daejeon, KR;

Ju Youb Lee, Seoul, KR;

Woon Song, Seoul, KR;

Jin Ho Choi, Daejeon, KR;

Sang Jung Ahn, Daejeon, KR;

Joon Lyou, Seoul, KR;

Won Young Song, Incheon, KR;

Jae Wan Hong, Seoul, KR;

Seung Hun Baek, Seoul, KR;

Inventors:

Byong Chon Park, Daejeon, KR;

Ju Youb Lee, Seoul, KR;

Woon Song, Seoul, KR;

Jin Ho Choi, Daejeon, KR;

Sang Jung Ahn, Daejeon, KR;

Joon Lyou, Seoul, KR;

Won Young Song, Incheon, KR;

Jae Wan Hong, Seoul, KR;

Seung Hun Baek, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 30/02 (2010.01); B82Y 35/00 (2011.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
G01Q 30/02 (2013.01); B82Y 35/00 (2013.01); H01J 37/28 (2013.01);
Abstract

Provided is a fusion measurement apparatus which increases or maximizes the reliability of a measurement. The fusion measurement apparatus includes an atomic microscope for measuring a surface of a substrate at an atomic level, an electron microscope for measuring the atomic microscope and the substrate, and at least one electrode which distorts the path of a secondary electron on the substrate covered by a cantilever of the atomic microscope so that the secondary electron proceeds to an electron detector of the electron microscope.


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