Korea Research Institute of Standards and Science

Nanofocus Inc.

Joon Lyou

Jae Wan Hong

Sang Jung Ahn

Jin Ho Choi

Byong Chon Park

Won Young Song

Woon Song

Seung Hun Baek

Ki Young Jung

Ju Youb Lee

Provided is a fusion measurement apparatus which increases or maximizes the reliability of a measurement. The fusion measurement apparatus includes an atomic microscope for measuring a surface of a substrate at an atomic level, an electron microscope for measuring the atomic microscope and the substrate, and at least one electrode which distorts the path of a secondary electron on the substrate covered by a cantilever of the atomic microscope so that the secondary electron proceeds to an electron detector of the electron microscope.

Substrate measurement apparatus with electron distortion unit

An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron microscope configured to navigate the repairing atomic electron microscope to the defective portion of the photo mask and to observe the photo mask repair process, and an imaging atomic microscope configured to image in-situ a shape of a repaired photo mask.

Apparatus and method for repairing photo mask

Growing community of inventors

Seoul, South Korea

Joon Lyou