The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2012
Filed:
Jul. 29, 2010
Byong Chon Park, Daejeon, KR;
Sang Jung Ahn, Daejeon, KR;
Jin Ho Choi, Incheon, KR;
Joon Lyou, Seoul, KR;
Jae Wan Hong, Seoul, KR;
Won Young Song, Incheon, KR;
Ki Young Jung, Seoul, KR;
Byong Chon Park, Daejeon, KR;
Sang Jung Ahn, Daejeon, KR;
Jin Ho Choi, Incheon, KR;
Joon Lyou, Seoul, KR;
Jae Wan Hong, Seoul, KR;
Won Young Song, Incheon, KR;
Ki Young Jung, Seoul, KR;
Nanofocus Inc., Seoul, KR;
Korea Research Institute of Standards and Science, Daejeon, KR;
Abstract
An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron microscope configured to navigate the repairing atomic electron microscope to the defective portion of the photo mask and to observe the photo mask repair process, and an imaging atomic microscope configured to image in-situ a shape of a repaired photo mask.