Jong Il Noh

Title: Jong Il Noh: Innovator in CMP Slurry Composition

Introduction

Jong Il Noh is a notable inventor based in Uiwang-si, South Korea. He has made significant contributions to the field of chemical mechanical polishing (CMP) with a focus on slurry compositions for polishing copper lines. With a total of 4 patents, his work has advanced the technology used in semiconductor manufacturing.

Latest Patents

Jong Il Noh's latest patents include a CMP slurry composition for polishing copper lines and a polishing method using the same. The first patent describes a CMP slurry composition that comprises colloidal silica, an oxidizing agent, a complexing agent, a corrosion inhibitor, a pH regulator, and ultrapure water. This composition is designed to achieve an excellent copper line polishing rate while minimizing defects and scratches. The second patent focuses on a CMP slurry composition that includes polishing particles and deionized water, where both inorganic and organic particles possess a positive zeta potential. This innovation also includes a method for polishing copper wire using the developed CMP slurry.

Career Highlights

Throughout his career, Jong Il Noh has worked with prominent companies such as Samsung SDI Co., Inc. and Cheil Industries Inc. His experience in these organizations has contributed to his expertise in developing advanced polishing solutions.

Collaborations

Jong Il Noh has collaborated with notable coworkers, including Dong Hun Kang and Jeong Hwan Jeong. Their combined efforts have furthered the development of innovative CMP technologies.

Conclusion

Jong Il Noh's contributions to CMP slurry compositions have significantly impacted the semiconductor industry. His innovative patents and collaborations highlight his role as a key inventor in this field.