The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2017
Filed:
Dec. 27, 2007
Homer Chou, Seongnam-si, KR;
Won Lae Kim, Seoul, KR;
Jong IL Noh, Daegu Gwangyeok-si, KR;
IN Kyung Lee, Euiwang-si, KR;
Tae Young Lee, Gunpo-si, KR;
Homer Chou, Seongnam-si, KR;
Won Lae Kim, Seoul, KR;
Jong Il Noh, Daegu Gwangyeok-si, KR;
In Kyung Lee, Euiwang-si, KR;
Tae Young Lee, Gunpo-si, KR;
Samsung SDI Co., Ltd., Yongin-si, KR;
Abstract
Provided is a slurry composition for chemical mechanical polishing (CMP) of a metal. The slurry composition comprises a copolymer whose average molecular weight is from about 600,000 to about 1,300,000 and whose monomers are acrylic acid and acrylamide in a molar ratio of about 1:30 to about 30:1. The slurry composition exhibits a non-Prestonian behavior to achieve minimized dishing and attain a high degree of planarization.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile