Jonathan Sungehul Kim

Title: Innovations of Jonathan Sungehul Kim

Introduction

Jonathan Sungehul Kim is a notable inventor based in Danville, CA (US). He has made significant contributions to the field of material science and engineering, holding a total of 8 patents. His work primarily focuses on advanced deposition processes and etching techniques that enhance the performance and efficiency of semiconductor manufacturing.

Latest Patents

One of his latest patents is related to an in-situ deposition process. This patent provides methods and apparatus for forming a desired material layer on a substrate during various stages of a patterning process. The method involves pulsing a first gas precursor onto the substrate's surface, attaching a first element from the precursor, and maintaining a substrate temperature below 110 degrees Celsius. It also includes pulsing a second gas precursor and attaching a second element to the first element on the substrate's surface.

Another significant patent by Kim is a method of enhanced selectivity of hard masks using plasma treatments. This implementation describes an etching process that allows for high selectivity when etching materials. The method includes exposing a cobalt mask layer to a fluorine-containing gas mixture to form a passivation film, followed by etching a gate material through openings defined in the cobalt mask layer.

Career Highlights

Throughout his career, Jonathan has worked with prominent companies in the semiconductor industry, including Lam Research Corporation and Applied Materials, Inc. His experience in these organizations has allowed him to develop innovative solutions that address complex challenges in material processing.

Collaborations

Jonathan has collaborated with several talented individuals in his field, including Kyeong-Koo Chi and Hailong Zhou. These collaborations have contributed to the advancement of technologies in semiconductor manufacturing.

Conclusion

Jonathan Sungehul Kim's contributions to the field of material science and engineering are noteworthy. His innovative patents and career achievements reflect his dedication to advancing technology in semiconductor manufacturing.