Company Filing History:
3 out of 164,197 
2 out of 37,972 
1 out of 641 
Years Active: 1979-2006
Title: John W Coburn: Innovator in Substrate Analysis and Etching Methods
Introduction
John W Coburn is a notable inventor based in San Jose, CA, with a focus on methods and systems for substrate analysis. He holds a total of 6 patents, showcasing his contributions to the field of technology and materials science.
Latest Patents
One of his latest patents involves methods and systems for preparing a copper-containing substrate for analysis. This innovative method includes removing a portion of a copper structure on the substrate using an etch chemistry in combination with an electron beam. The etch chemistry is designed to be substantially inert with respect to the copper structure, except in the presence of the electron beam. Another method he developed involves forming masking layers on a substrate to protect it during etching. This method includes exposing a first portion of the substrate to an electron beam while leaving a second portion, which contains a copper structure, unexposed. The substrate is then treated with a fluorine-containing chemical that bonds to the exposed portion but not to the copper structure, forming a protective layer.
Additionally, Coburn has developed a plasma etching method using low ionization potential gas. This etching method is designed for forming openings in a substrate assembly that has a surface and an oxide layer. A patterned mask layer is placed over the oxide layer, exposing a portion of it. The etching process utilizes a plasma that includes C H F ions and C F ions, along with xenon or krypton ions, to etch the oxide layer at the exposed portion, defining the opening while simultaneously depositing a polymeric residue.
Career Highlights
Throughout his career, John W Coburn has worked with prominent companies such as IBM and Micron Technology Incorporated. His experience in these organizations has contributed significantly to his expertise in substrate analysis and etching technologies.
Collaborations
Coburn has collaborated with notable colleagues, including Eric Kay and Kevin G Donohoe, further enhancing his work in the field.
Conclusion
John W Coburn's innovative contributions to substrate analysis and etching methods have made a significant impact in the technology sector. His patents reflect a deep understanding of materials science and engineering, positioning him as a key figure in his field.