This inventor holds 1 USPTO granted patent, plus 1 CIPO patent and 1 EPO patent. Top assignee: Zilog, Inc.. Active years: 1993.
Company Filing History:
Years Active: 1993
Title: John Rule - Innovator in Semiconductor Technology
Introduction
John Rule is a notable inventor based in Nampa, ID (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods for doping polysilicon layers.
Latest Patents
John Rule holds a patent for a method of doping a polysilicon layer on a semiconductor wafer. This invention involves supplying phosphorous oxychloride to the silicon wafer at the beginning of the oven temperature ramping. By introducing the phosphorous oxychloride earlier than in prior art methods, his invention effectively reduces the poly rho and poly rho sigma of the doped polysilicon layer. Additionally, it helps to maintain the junction depth of the doped silicon region by reducing the root DT of the diffusion of the doped material.
Career Highlights
Throughout his career, John Rule has worked with several prominent companies, including Zilog, Inc. and Lilliputian Systems, Inc. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.
Collaborations
John has collaborated with notable coworkers such as Gregory Hindman and Jack Berg, further enhancing his contributions to the field.
Conclusion
John Rule's innovative methods in semiconductor technology demonstrate his commitment to advancing the industry. His patent and career achievements reflect his significant impact on the field of electronics.