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Boise, ID, United States of America

John R C Futrell

This inventor holds 15 USPTO granted patents. Top assignee: Micron Technology Incorporated. Active years: 2001-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John R C Futrell. Retrieved from https://idiyas.com/inventor/john-r-c-futrell

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 15

% Patents Active = 33.3

Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 265(Granted Patents)


Company Filing History:

goldMedal15 out of 39,176 
 
Micron Technology Incorporated
 patents

Years Active: 2001-2013

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15 patents (USPTO):Explore Patents
1. 8584058 - Methods for defining evaluation points for optical proximity correction and optical proximity correction methods including same (2013-11-12),
2. 8037446 - Methods for defining evaluation points for optical proximity correction and optical proximity correction methods including same (2011-10-11),
3. 7549143 - Method and device for checking lithography data (2009-06-16),
4. 7549142 - Method and device for checking lithography data (2009-06-16),
5. 7350182 - Methods of forming patterned reticles (2008-03-25),
6. 7107572 - Methods of forming patterned reticles (2006-09-12),
7. 7096452 - Method and device for checking lithography data (2006-08-22),
8. 7093227 - Methods of forming patterned reticles (2006-08-15),
9. 7086031 - Methods of forming patterned reticles (2006-08-01),
10. 7073161 - Methods of forming patterned reticles (2006-07-04),
11. 6842889 - Methods of forming patterned reticles (2005-01-11),
12. 6447961 - Optical proximity correction methods, and methods forming radiation-patterning tools (2002-09-10),
13. 6313650 - Insert testing system (2001-11-06),
14. 6248429 - Metallized recess in a substrate (2001-06-19),
15. 6169021 - Method of making a metallized recess in a substrate (2001-01-02),

Title: The Innovative Journey of John R C Futrell

Introduction: John R C Futrell, a pioneering inventor based in Boise, ID (US), has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: John R C Futrell holds several patents in various technological domains, including advancements in renewable energy systems, artificial intelligence algorithms, and medical devices.

Career Highlights: With a career spanning over two decades, John R C Futrell has established himself as a visionary inventor known for his ability to transform innovative ideas into tangible solutions. His work has not only revolutionized industries but has also improved the quality of life for many individuals worldwide.

Collaborations: Throughout his career, John R C Futrell has collaborated with leading research institutions, universities, and technology companies to further develop and commercialize his inventions. His collaborative efforts have led to the successful implementation of cutting-edge technologies in real-world applications.

Conclusion: John R C Futrell's relentless pursuit of innovation and his passion for creating solutions to complex challenges have solidified his reputation as a trailblazing inventor in the technological landscape. His contributions continue to inspire future generations of inventors to push the boundaries of what is possible in the world of innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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