Palo Alto, CA, United States of America

John O Dukovic

USPTO Granted Patents = 10 

Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 47(Granted Patents)


Company Filing History:


Years Active: 2007-2024

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10 patents (USPTO):

Title: Innovations of John O Dukovic

Introduction

John O Dukovic is a prominent inventor based in Palo Alto, California. He has made significant contributions to the field of photolithography, holding a total of 10 patents. His work primarily focuses on enhancing the efficiency and effectiveness of photoresist applications in semiconductor manufacturing.

Latest Patents

One of his latest patents is an apparatus for post exposure bake of photoresist. This invention provides a method and apparatus for applying an electric field and/or a magnetic field to a photoresist layer without air gap intervention during photolithography processes. The system includes a transfer device and multiple modules, allowing for the rotation of substrates between heating and cooling pedestals. Another notable patent also addresses the post exposure bake of photoresist, featuring an electrode assembly with a permeable electrode and a base assembly designed to fill a process volume with a process fluid. This innovative approach aims to improve the application of electric fields to substrates during processing.

Career Highlights

John O Dukovic is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has positioned him as a key player in advancing photolithography technologies.

Collaborations

Throughout his career, Dukovic has collaborated with notable colleagues, including Srinivas D Nemani and Sergey D Lopatin. These collaborations have further enriched his contributions to the field.

Conclusion

John O Dukovic's innovative work in photolithography and his numerous patents reflect his dedication to advancing semiconductor manufacturing technologies. His contributions continue to influence the industry significantly.

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