John K Chu

Title: Innovations by John K Chu

Introduction

John K Chu is a notable inventor based in Fremont, CA, who has made significant contributions to the field of technology. With a total of 4 patents to his name, he has demonstrated a commitment to advancing innovative solutions in his area of expertise.

Latest Patents

One of his latest patents is focused on the removal of residue from a substrate. This invention discloses a method and an apparatus for removing a particle from a metal plug on a substrate. The method involves introducing a slurry onto the metal layer and polishing it. Additionally, a solution comprising hydrogen peroxide is introduced onto the metal plug, allowing for the removal of at least one particle from the metal plug. Another significant patent by John K Chu is related to a crack-resistant passivation layer. This invention outlines a method for making a device that utilizes a passivation layer with improved crack resistance. This is achieved through the incorporation of boron into a PSG passivation layer, ensuring that the temperature during the passivation deposition is maintained low enough to prevent the decomposition of the boron compound before it reacts with other reactants.

Career Highlights

John K Chu is currently employed at Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing and computing technology. His work at Intel has allowed him to contribute to cutting-edge advancements in the industry.

Collaborations

Throughout his career, John has collaborated with several talented individuals, including Sanjiv K Mittal and John T Orton. These collaborations have further enriched his work and contributed to the success of his inventions.

Conclusion

John K Chu's innovative patents and contributions to technology highlight his role as a significant inventor in the field. His work continues to influence advancements in technology and showcases the importance of innovation in driving progress.