John D Pollock

Title: Innovative Contributions of John D Pollock

Introduction

John D Pollock is a distinguished inventor based in Rowley, MA, who has made significant strides in the field of chemical vapor deposition and ion implantation. With a prolific record of 21 patents, his innovations showcase a blend of technical prowess and creative problem-solving.

Latest Patents

Among his latest inventions is the "Rotating disk reactor with ferrofluid seal for chemical vapor deposition." This innovative reactor design features a vacuum chamber and a specialized ferrofluid feedthrough, which includes upper and lower seals for enhanced functionality. The setup allows for a motor to rotate a turntable within the vacuum chamber, facilitating efficient chemical vapor deposition processes on substrate carriers. Additionally, Pollock has patented an "Implant method and implanter by using a variable aperture." This device utilizes a variable aperture to shape ion beams before implanting them on substrates, enabling customized ion beam applications without the complications of multiple fixed apertures or retuning efforts.

Career Highlights

Throughout his career, John D Pollock has contributed to notable companies including Advanced Ion Beam Technology, Inc. and Axcelis Technologies, Inc. His expertise in ion beam technology has led to advancements that streamline processes and improve outcomes in the semiconductor manufacturing sector.

Collaborations

In his journey as an inventor, Pollock has collaborated with talented professionals such as John W Vanderpot and Donald Wayne Berrian. These partnerships have fostered an environment of innovation and have helped bring his ideas to fruition.

Conclusion

John D Pollock's contributions to the fields of chemical vapor deposition and ion implantation illustrate the impact that dedicated inventors can have on technology. With his impressive portfolio of patents and collaborative spirit, Pollock continues to be a vital player in advancing modern manufacturing techniques.