Wescosville, PA, United States of America

John Charles Desko


Average Co-Inventor Count = 4.3

ph-index = 3

Forward Citations = 41(Granted Patents)


Company Filing History:


Years Active: 2002-2009

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7 patents (USPTO):Explore Patents

Title: John Charles Desko: Innovator in Semiconductor Technology

Introduction

John Charles Desko is a notable inventor based in Wescosville, PA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work has focused on improving the mechanical and electrical properties of semiconductor devices.

Latest Patents

One of his latest patents is for Lateral Double Diffused MOS Transistors. This specification describes an improved mechanical electrode structure for MOS transistor devices with elongated runners. It recognizes that shrinking the geometry increases the likelihood of mechanical failure of comb electrode geometries. The mechanical integrity of a comb electrode is improved by interconnecting the electrode fingers in a cross-connected grid. In one embodiment, the transistor device is interconnected with gate fingers on a lower metallization level, typically the first level metal, with the drain interconnected at a higher metal level. This design allows the drain fingers to be cross-connected with a vertical separation between drain and gate comb electrodes. The cross-connect members may be further stabilized by adding beam extensions to the cross-connect members. The beam extensions may be anchored in an interlevel dielectric layer for additional support.

Another significant patent is a Method for Making Enhanced Substrate Contact for a Semiconductor Device. This method involves forming a semiconductor structure in a semiconductor wafer, which includes the steps of forming an epitaxial layer on at least a portion of a semiconductor substrate of a first conductivity type and forming at least one trench through the epitaxial layer to at least partially expose the substrate. The method further includes doping at least one or more sidewalls of the trench with an impurity of a known concentration level. The trench is then substantially filled with a filler material, creating a low-resistance electrical path between the upper surface of the epitaxial layer and the substrate.

Career Highlights

Throughout his career, John has worked with prominent companies such as Agere Systems Inc. and Agere Systems Guardian Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

John has collaborated with notable coworkers, including Bailey R. Jones and Chung-Ming Hsieh. Their combined expertise has contributed to advancements in the field.

Conclusion

John Charles Desko is a distinguished inventor whose work in semiconductor technology has led to multiple patents and significant advancements in the industry

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