John C Egermeier

Title: Innovations of John C Egermeier

Introduction

John C Egermeier is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of optical waveguides and semiconductor memory devices. With a total of 6 patents to his name, Egermeier's work has had a considerable impact on technology.

Latest Patents

One of his latest patents is titled "As-deposited planar optical waveguides with low scattering loss and methods for their manufacture." This invention describes a waveguide structure formed by a vapor deposition process without the need for etching core material. The design includes a ridge-structured lower cladding layer made of low refractive index material, which supports a core layer of higher refractive index material. Another significant patent is for a "Method for superior step coverage and interface control for high K dielectric capacitors and related electrodes." This invention focuses on a multi-layer semiconductor memory device that enhances the quality of high-density DRAMs, ensuring low leakage currents and high-quality dielectric films.

Career Highlights

Egermeier has worked with prominent companies such as Applied Materials, Inc. and Springworks, LLC. His experience in these organizations has allowed him to develop innovative solutions in the semiconductor and optical fields.

Collaborations

Throughout his career, Egermeier has collaborated with talented individuals, including Mark A Mueller and Xin Sheng Guo. These partnerships have contributed to the advancement of his inventions and the overall progress in his areas of expertise.

Conclusion

John C Egermeier's contributions to technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape advancements in optical and semiconductor technologies.