The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2001
Filed:
Jun. 25, 1999
John Egermeier, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present invention provides techniques for processing effluent gases from vacuum fabrication processes. The effluent gases are condensed on cold surfaces (,and,) inside a novel pump (,) resulting in a high vacuum. The pump (,) can be connected to a vacuum fabrication processing chamber (,) and to a turbo molecular pump (,). The condensate which is formed on the cold surfaces of the pump (,) is subsequently evaporated to form regenerated gases during the regeneration of the pump. A pressure vessel (,) is removably connected to the pump during regeneration, causing the regenerated gases to fill the pump and the pressure vessel at pressures ranging from about 10,343 torr (200 psi) to about 103,430 torr ( 2,000 psi). The pressure vessel is closed when substantially all condensate has evaporated. The vessel containing regenerated gases can then be connected to an on-site or to a remote gas treatment facility for removal of noxious substances. In an additional embodiment, an effluent gas processing system (,) is provided, including a controller (,) which is adapted for interacting with a plurality of unit operations (,and,) of the novel gas processing techniques.