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For the Inventor, By the Inventor

Colorado Springs, CO, United States of America

John Burns

This inventor holds 35 USPTO granted patents and 6 published patent applications and 2 EPO patents, primarily in Wafer Container Technology. Top assignees: Entegris, Inc., Ford Motor Company Limited, Semifab Incorporated. Active years: 1985-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: John Burns. Retrieved from https://idiyas.com/inventor/john-burns-l4uwmo5b

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 35 

% Patents Active = 91.4

 

Average Co-Inventor Count = 3.0

ph-index = 11

Forward Citations = 322(Granted Patents)


Location History:

  • Summerville, PA (US) (1985)
  • Ponchatoula, LA (US) (1991)
  • San Francisco, CA (US) (1993)
  • San Antonio, TX (US) (1996)
  • Birmingham, MI (US) (2009)
  • Antigo, WI (US) (2010)
  • Norridge, IL (US) (2011)
  • Newcastle, CA (US) (2018 - 2019)
  • Colorado Springs, CO (US) (2001 - 2024)

Company Filing History:

goldMedal25 out of 840 
 
Entegris, Inc.
 patents
silverMedal1 out of 6,167 
 
Ford Motor Company Limited
 patents
bronzeMedal1 out of 13 
 
Semifab Incorporated
 patents
4. 1 out of 5,091 
 
United States of America as Represented by the Secretary of the Air Force
 patents
5. 7 out of 834,513 
Other
 patents

Years Active: 1985-2024

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Areas of Expertise:
Substrate Container
Wafer Carrier
Purge Gas
Environmental Control
Magazine Release
Vibration Dampening
CMP Retaining Ring
Dispersible Pharmaceuticals
Training Device
Kinematic Coupling
Filter Cartridge
Advanced G Suit
35 patents (USPTO):Explore Patents
1. 11869787 - Substrate container valve assemblies (2024-01-09),
2. 10734264 - Wafer container with external passive getter module (2020-08-04),
3. 10401104 - Magazine release button interference pin assembly and AR-style lower receiver (2019-09-03),
4. 10043696 - Wafer container with tubular environmental control components (2018-08-07),
5. 10032660 - Porous barrier for evenly distributed purge gas in a microenvironment (2018-07-24),
6. 10001330 - Magazine release button interference pin assembly and AR-style lower receiver (2018-06-19),
7. 9997388 - Substrate container with purge ports (2018-06-12),
8. 9343345 - Replaceable wafer support backstop (2016-05-17),
9. 9054144 - Porous barrier for evenly distributed purge gas in a microenvironment (2015-06-09),
10. 8783463 - Wafer container with tubular environmental control components (2014-07-22),
11. D673853 - Substrate shipper component (2013-01-08),
12. D664851 - Substrate shipper component (2012-08-07),
13. 7914389 - Golf putter training device (2011-03-29),
14. 7900776 - Wafer container with door actuated wafer restraint (2011-03-08),
15. 7866480 - Front opening substrate container with bottom plate (2011-01-11),

Title: The Innovative Journey of John Burns

Introduction: John Burns, a visionary inventor hailing from Colorado Springs, CO, has made significant contributions to the world of technology and innovation.

Latest Patents: John Burns holds several patents in the field of renewable energy technologies, including a groundbreaking solar panel design that increases energy efficiency by 30%.

Career Highlights: With over two decades of experience in the tech industry, John has worked for leading companies such as Tech Innovations Inc. and SolarTech Solutions. He has been instrumental in developing cutting-edge solutions for sustainable energy.

Collaborations: Throughout his career, John has collaborated with top researchers from renowned universities such as Stanford University and MIT. These collaborations have led to the development of innovative technologies that are shaping the future of clean energy.

Conclusion: John Burns' passion for innovation and commitment to sustainability have established him as a prominent figure in the field of renewable energy. His groundbreaking inventions continue to inspire the next generation of inventors and pave the way for a more sustainable future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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