Chung-Li, Taiwan

Joey Chiu


Average Co-Inventor Count = 9.7

ph-index = 3

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 2006-2008

where 'Filed Patents' based on already Granted Patents

3 patents (USPTO):

Title: The Innovations of Joey Chiu: A Pioneer in Low-K Dielectric Technologies

Introduction

Joey Chiu, an accomplished inventor located in Chung-Li, Taiwan, has made significant contributions to the field of semiconductor technology. With a portfolio of three patents, Chiu's work focuses on innovative methods that enhance the fabrication of low-K dielectrics, crucial for modern electronic devices.

Latest Patents

Chiu's most recent patents demonstrate his expertise in developing advanced interconnect structures. One notable patent is the "Method of Forming a Low-K Dual Damascene Interconnect Structure." This invention outlines a sophisticated method of fabricating interconnects by etching a via into both the upper and lower low K dielectric layers, highlighting precision and efficiency in the etching process.

Another important patent is titled "Selective Etching of Carbon-Doped Low-K Dielectrics." This process revolutionizes the etching technique for low-k dielectric materials, utilizing a specific plasma gas mixture to achieve high etching selectivity ratios and optimal etch rates. These innovations not only enhance the performance of electronic components but also contribute to the overall efficiency of semiconductor manufacturing.

Career Highlights

Currently, Chiu is associated with Applied Materials, Inc., a leading company in the development of equipment and services for the semiconductor industry. His role involves leveraging cutting-edge technology to push the boundaries of current fabrication processes. Chiu's patents reflect his dedication to advancing the field and solving complex engineering challenges faced by modern electronics.

Collaborations

Joey Chiu collaborates with talented individuals such as Yan Ye and Neungho Shin. Together, they form a team that fosters innovation and drives progress within their organization. Such collaborations are essential for producing groundbreaking developments in semiconductor technology, benefiting both the industry and consumers.

Conclusion

Joey Chiu's contributions to the semiconductor industry through his inventive patents exemplify the spirit of innovation. With a focus on low-K dielectrics, he is paving the way for more efficient electronic devices. His work not only enhances manufacturing processes but also sets new standards in the field, making him a notable figure among inventors in today's technological landscape.

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