Joelle Sharp

Title: Joelle Sharp: Innovator in Semiconductor Technology

Introduction

Joelle Sharp is a prominent inventor based in Herriman, UT (US). She has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. Her work focuses on enhancing the performance of field effect transistors and developing innovative substrate structures.

Latest Patents

One of her latest patents is titled "Power MOSFET having a strained channel in a semiconductor heterostructure on metal substrate." This invention involves a field effect transistor device that features a strained semiconductor channel region overlying a heterostructure-semiconductor on a metal substrate. The design includes a first semiconductor layer that is heavily doped and a second semiconductor layer that is more lightly doped. The strained channel region enhances carrier mobility, thereby improving the performance of the field effect transistor.

Another notable patent is the "Structure and method for forming hybrid substrate." In this invention, a first and a second substrate are bonded together to create a unitary hybrid substrate. Portions of the first substrate are removed to expose surface regions of the second substrate. A selective epitaxial growth process is then performed to form epitaxial silicon from the exposed surfaces of the second substrate, ensuring that the crystalline orientation matches that of the second substrate.

Career Highlights

Joelle has worked with several notable companies in the semiconductor industry, including Fairchild Semiconductor Corporation and Fairfield Semiconductor Corporation. Her experience in these organizations has allowed her to develop and refine her innovative ideas in semiconductor technology.

Collaborations

Throughout her career, Joelle has collaborated with talented individuals such as Gordon K Madson and Qi Wang. These partnerships have contributed to her success and the advancement of her inventions.

Conclusion

Joelle Sharp is a remarkable inventor whose work in semiconductor technology has led to significant advancements in the field. Her innovative patents and collaborations highlight her dedication to improving electronic devices and their performance.