Jiro Harada

Title: Jiro Harada: Innovator in Substrate Processing Technologies

Introduction

Jiro Harada is a notable inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 2 patents. His work focuses on developing advanced apparatuses that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

One of Harada's latest patents is the "Substrate Liquid Processing Apparatus." This apparatus includes a processing liquid storage unit designed to store a processing liquid, a processing liquid drain unit for draining the liquid, and a control unit that manages the operation. The control unit performs two modes: a constant concentration mode and a concentration changing mode. In the concentration changing mode, the control unit compares the set concentration before and after the change, initiating the draining process if the new concentration is lower.

Another significant patent is the "Separation Apparatus, Separation System, and Separation Method." This invention is aimed at separating a processing target substrate from a supporting substrate that are bonded with adhesive. It features a first holding unit for the processing target substrate, a second holding unit for the supporting substrate, and a moving mechanism that allows for horizontal movement. Additionally, a load measurement unit is included to assess the load during separation, with a control unit that adjusts the moving mechanism based on the measured load.

Career Highlights

Throughout his career, Jiro Harada has worked with prominent companies such as Tokyo Electron Limited and Intel Corporation. His experience in these organizations has contributed to his expertise in substrate processing technologies.

Collaborations

Harada has collaborated with notable coworkers, including Takahiro Kawazu and Takafumi Tsuchiya. These partnerships have likely enriched his work and led to innovative advancements in his field.

Conclusion

Jiro Harada is a distinguished inventor whose work in substrate processing technologies has led to valuable patents and advancements in the industry. His contributions continue to influence the field and showcase the importance of innovation in technology.