Company Filing History:
9 out of 309 
2 out of 93 Years Active: 2003-2011
Title: Jinru Bian: Innovator in Chemical Mechanical Polishing Solutions
Introduction
Jinru Bian is a prominent inventor based in Newark, DE (US), known for her significant contributions to the field of chemical mechanical polishing. With a total of 11 patents to her name, she has developed innovative solutions that enhance semiconductor manufacturing processes.
Latest Patents
Among her latest patents is the "Selective Barrier Slurry for Chemical Mechanical Polishing." This polishing solution is designed to effectively remove barriers from semiconductor substrates. The formulation includes a specific weight percentage of oxidizers, anionic surfactants, inhibitors for nonferrous metals, abrasives, complexing agents, and barrier removal agents, all while maintaining an acidic pH. Another notable patent is the "Multi-Component Barrier Polishing Solution," which is useful for removing barrier materials in the presence of nonferrous interconnect metals while minimizing dielectric erosion. This solution comprises oxidizers, inhibitors, organic-containing ammonium cationic salts, anionic surfactants, abrasives, and water, with a pH of less than 7.
Career Highlights
Jinru Bian has worked with several reputable companies throughout her career, including Rohm and Haas, Electronic Materials CMP Holdings, Inc., and Rodel Holdings, Inc. Her experience in these organizations has allowed her to refine her expertise in chemical mechanical polishing technologies.
Collaborations
Throughout her career, Jinru has collaborated with notable professionals in her field, including Tirthankar Ghosh and Terence M. Thomas. These collaborations have contributed to her innovative work and advancements in polishing solutions.
Conclusion
Jinru Bian's contributions to the field of chemical mechanical polishing are significant, as evidenced by her numerous patents and collaborations. Her innovative solutions continue to impact the semiconductor industry positively.