The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Sep. 25, 2003
Jinru Bian, Newark, DE (US);
Kai HU, Ambler, PA (US);
Hugh LI, Ellicott City, MD (US);
Zhendong Liu, Newark, DE (US);
John Quanci, Haddonfield, NJ (US);
Matthew R. Vanhanehem, Bear, DE (US);
Jinru Bian, Newark, DE (US);
Kai Hu, Ambler, PA (US);
Hugh Li, Ellicott City, MD (US);
Zhendong Liu, Newark, DE (US);
John Quanci, Haddonfield, NJ (US);
Matthew R. VanHanehem, Bear, DE (US);
Rohm and Haas Electronic Materials CMP Holdings, Inc., Newark, DE (US);
Abstract
The solution is useful for removing a barrier material from a semiconductor substrate. The solution comprises, by weight percent, 0.01 to 25 oxidizer, 0 to 15 inhibitor for a nonferrous metal, 0 to 15 abrasive, 0 to 20 complexing agent for the nonferrous metal, 0.01 to 12 barrier removal agent and balance water. The barrier removal agent is selected from the group comprising imine derivative compounds, hydrazine derivative compounds and mixtures thereof.