This inventor holds 19 USPTO granted patents and 16 published patent applications, primarily in Atomic Layer Deposition. Top assignee: Sky Tech Inc.. Active years: 2024-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2026
Areas of Expertise:
Title: Innovations of Jing-cheng Lin
Introduction
Jing-cheng Lin is a prominent inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of technology, particularly in the area of deposition equipment. With a total of 17 patents to his name, Lin's work has had a substantial impact on the industry.
Latest Patents
One of his latest inventions is a wafer carrier with adjustable alignment devices and deposition equipment using the same. This innovative wafer carrier is designed to enhance the accuracy of alignment in deposition machines. It comprises a tray and several adjustable aligning devices that are strategically placed around the tray. These devices include a base and an alignment pin, which can be adjusted to align a clamp ring of the deposition machine. The ability to move the alignment pins relative to the tray allows for precise adjustments, improving the overall efficiency of the deposition process.
Another notable patent is the thin-film-deposition equipment, which features a main body, a carrier, and a shielding device. The main body contains a reaction chamber and two sensor areas that are smaller than the chamber. The shielding device consists of two shield members and a driver that enables them to move in opposite directions. This design allows for effective separation during the deposition process and provides a shielding state during cleaning, ensuring the protection of the carrier.
Career Highlights
Jing-cheng Lin is currently employed at Sky Tech Inc., where he continues to innovate and develop advanced technologies. His work has been instrumental in pushing the boundaries of what is possible in the field of thin-film deposition.
Collaborations
Lin collaborates with talented individuals such as Jung-hua Chang and Chia-Cheng Ku, contributing to a dynamic and innovative work environment.
Conclusion
Jing-cheng Lin's contributions to technology through his patents and innovations have established him as a key figure in the industry. His work continues to influence advancements in deposition equipment, showcasing the importance of innovation in driving progress.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile