The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2024
Filed:
May. 30, 2021
Sky Tech Inc., Hsinchu County, TW;
Jing-Cheng Lin, Hsinchu County, TW;
Jung-Hua Chang, Hsinchu County, TW;
Chia-Cheng Ku, Hsinchu County, TW;
SKY TECH INC., Hsinchu County, TW;
Abstract
An atomic layer deposition apparatus for powders is disclosed. The atomic layer deposition apparatus includes a vacuum chamber, a shaft sealing device, and a driving unit. The shaft sealing device includes an outer tube and an inner tube, wherein the inner tube extends from an accommodating space of the outer tube to a reaction space of the vacuum chamber, forming a protruding tube part in the reaction space. The driving unit drives the vacuum chamber to rotate through the outer tube to agitate the powders in the reaction space. The ratio between the protruding tube part and the reaction space is within a specific range, so that a non-reactive gas delivered to the reaction space blows the powders around in the reaction space and spreads the powders to various areas of the reaction space to form a thin film with a uniform thickness on the surface of the powders.