This inventor holds 2 USPTO granted patents. Top assignees: Semiconductor Manufacturing International (Beijing) Corporation, Semiconductor Manufacturing International (Shanghai) Corporation. Active years: 2017-2018.
Company Filing History:
2 out of 948 
2 out of 1,749 
Years Active: 2017-2018
Title: The Innovative Mind of Jing An Hao: Pioneering Advances in Alignment Technologies
Introduction
Jing An Hao, a distinguished inventor based in Shanghai, China, has made significant contributions to the field of alignment technologies. With a robust portfolio consisting of two patents, Hao has demonstrated an exceptional ability to design systems and methods that enhance precision in semiconductor manufacturing.
Latest Patents
Jing An Hao's latest patents reflect his expertise in developing advanced alignment methods and systems. His first patent, titled "Alignment Method and Alignment System Thereof," outlines a comprehensive approach that includes providing a wafer with an exposed surface featuring both an alignment mark and a reference point. The method involves performing alignment measurements and levelling measurements to obtain crucial data that improves the accuracy of photolithography processes. Such innovations significantly contribute to the efficiency of microelectronics fabrication.
Another noteworthy patent is the "Interconnection Structure, Fabricating Method Thereof, and Exposure Alignment System." This invention details a systematic procedure that begins with the provision of a wafer and includes the formation of alignment members within a conductive layer. The method optimizes the interconnection structure and adjusts the wafer positioning based on stacking offsets. These advancements promise to enhance electrical interconnections in semiconductor devices.
Career Highlights
Throughout his career, Jing An Hao has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Beijing and Shanghai. His roles in these prestigious firms have allowed him to apply his innovative skills in a practical environment, driving forward advancements in manufacturing processes.
Collaborations
Hao has collaborated with talented individuals such as Qiang Zhang and Bin Xing, working together to push the frontiers of semiconductor technology. Their combined efforts have fostered an environment of innovation, resulting in groundbreaking inventions that have the potential to reshape the industry.
Conclusion
Jing An Hao stands out as a visionary inventor with a proven track record in advancing alignment technologies within the semiconductor sector. His patents not only reflect his technical ingenuity but also highlight his dedication to improving manufacturing processes. With his contributions, the landscape of semiconductor technology continues to evolve, paving the way for future innovations.