This inventor holds 3 USPTO granted patents. Top assignee: Korea Kumho Petrochemical Co., Ltd.. Active years: 2013-2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Seoul, KR (2013)
- Chungcheongnam-do, KR (2014)
- Asan-si, KR (2016)
Company Filing History:
Years Active: 2013-2016
Title: Innovations of Jin Bong Shin
Introduction
Jin Bong Shin is a notable inventor based in Asan, South Korea. He has made significant contributions to the field of resist technology, particularly in the development of additives and compositions that enhance the performance of resist materials in lithographic processes. With a total of 3 patents to his name, his work is recognized for its innovative approach to improving sensitivity and resolution in resist applications.
Latest Patents
One of his latest patents is titled "Additive for resist and resist composition comprising same." This invention provides an additive that can suppress leaching caused by water during immersion lithography. By increasing the hydrophobicity of the resist film's surface during exposure, this additive enables the formation of fine resist patterns with excellent sensitivity and resolution. Another significant patent is "Copolymer for resist comprising novel acryl based monomer and resin composition for resist comprising the same." This patent describes a resist resin composition that includes a specific copolymer, a photoacid generator, and a solvent, which together enhance the performance of resist materials.
Career Highlights
Jin Bong Shin is currently employed at Korea Kumho Petrochemical Co., Ltd., where he continues to innovate in the field of resist technology. His work has been instrumental in advancing the capabilities of resist materials used in various applications, particularly in the semiconductor industry.
Collaborations
Throughout his career, Jin Bong Shin has collaborated with notable colleagues, including Dong Chul Seo and Hyun Soon Lim. These collaborations have contributed to the development of cutting-edge technologies in resist applications.
Conclusion
Jin Bong Shin's contributions to resist technology through his innovative patents and collaborations highlight his role as a significant inventor in the field. His work continues to influence advancements in lithographic processes and resist materials.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile