The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2013
Filed:
Feb. 07, 2012
Jung Hoon OH, Chungcheongnam-do, KR;
Jin Bong Shin, Seoul, KR;
Tae Gon Kim, Chungcheongnam-do, KR;
Dong Chul Seo, Chungcheongnam-do, KR;
Jung Hoon Oh, Chungcheongnam-do, KR;
Jin Bong Shin, Seoul, KR;
Tae Gon Kim, Chungcheongnam-do, KR;
Dong Chul Seo, Chungcheongnam-do, KR;
Korea Kumho Petrochemical Co., Ltd., Seoul, KR;
Abstract
A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y, Y, X, R, R, n, nand Ahave the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.