Boise, ID, United States of America

Jigish D Trivedi



Average Co-Inventor Count = 1.6

ph-index = 18

Forward Citations = 1,148(Granted Patents)


Inventors with similar research interests:


Location History:

  • Bosie, ID (US) (2004)
  • Boise, ID (US) (1998 - 2015)

Company Filing History:


Years Active: 1998-2015

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Areas of Expertise:
Capacitorless Dram
Recessed Access Device
Semiconductor Constructions
Low Resistance Metal Silicide
Shallow Trench Isolation
Field Effect Transistor
Antifuse Technology
Local Interconnect Structure
Dual Damascene Interconnect
Integrated Circuit Devices
Sub-Micron Space Liner
Transistor Gate Fabrication
107 patents (USPTO):Explore Patents

Title: The Innovative Journey of Jigish D Trivedi

Introduction:

Jigish D Trivedi, a talented inventor based in Boise, ID (US), has made significant contributions to the field of innovations with his creative mindset and dedication to problem-solving.

Latest Patents:

Jigish D Trivedi holds several patents in various industries, showcasing his versatility and ingenuity in inventing novel solutions to complex challenges.

Career Highlights:

Throughout his career, Jigish D Trivedi has demonstrated a remarkable ability to transform ideas into tangible inventions that have the potential to impact numerous sectors positively. His passion for innovation has led to the development of groundbreaking technologies that have garnered attention on a global scale.

Collaborations:

Jigish D Trivedi has collaborated with leading research institutions, universities, and companies to further enhance his inventions and bring them to market successfully. His collaborative spirit and willingness to work with diverse teams have been instrumental in the success of his projects.

Conclusion:

In conclusion, Jigish D Trivedi's innovative spirit, coupled with his determination to push the boundaries of what is possible, has established him as a prominent figure in the world of inventions. His relentless pursuit of excellence continues to inspire aspiring inventors and researchers worldwide.

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