Beijing, China

Jiebin Niu


Average Co-Inventor Count = 7.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014-2025

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5 patents (USPTO):

Title: Innovations of Jiebin Niu

Introduction

Jiebin Niu is a prominent inventor based in Beijing, China. He has made significant contributions to the field of technology, particularly in the area of lithography and material fabrication. With a total of four patents to his name, Niu's work showcases his expertise and innovative spirit.

Latest Patents

One of Jiebin Niu's latest patents is a method for fabricating an anti-reflective layer on a quartz surface using a metal-induced self-masking etching technique. This method involves performing reactive ion etching on a metal material and a quartz substrate with a mixed gas containing a fluorine-based gas. The process results in the formation of a non-volatile metal fluoride on the quartz surface, which aids in creating a micromask for simultaneous etching, ultimately leading to an anti-reflective layer with a sub-wavelength structure.

Another notable patent is a defect detection system for extreme ultraviolet lithography masks. This system includes an extreme ultraviolet light source, transmission parts, a lithography mask, a photon sieve, and a collection and analysis system. The innovative use of a photon sieve in this system allows for lower costs, reduced size, and high resolution in detecting defects on lithography masks.

Career Highlights

Jiebin Niu is affiliated with the Chinese Academy of Sciences, where he conducts research and development in advanced technologies. His work has been instrumental in enhancing the capabilities of lithography processes, which are crucial in semiconductor manufacturing.

Collaborations

Niu has collaborated with notable colleagues, including Ming Liu and Changqing Xie. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Jiebin Niu's innovative contributions to technology, particularly in lithography and material fabrication, highlight his role as a leading inventor in his field. His patents reflect a commitment to advancing technology and improving manufacturing processes.

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