Taoyuan, Taiwan

Jie-Huang Huang


Average Co-Inventor Count = 9.6

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2020-2024

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4 patents (USPTO):

Title: Jie-Huang Huang: Innovator in Semiconductor Technology

Introduction

Jie-Huang Huang is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on advancing semiconductor structures, which are crucial for modern electronic devices.

Latest Patents

Huang's latest patents include innovative semiconductor structures with doped via plugs. One patent describes a semiconductor structure that features a gate structure over a substrate, with source/drain structures positioned on either side of the gate. This structure also incorporates a dielectric layer that covers the gate and source/drain structures, along with a via plug that passes through the dielectric layer and contains a first group IV element. Another patent outlines a similar semiconductor structure, but with a gate structure over a fin structure, including a source/drain structure within the fin and adjacent to the gate. This design also features a contact plug and a dielectric layer surrounding the via plug, enhancing the overall functionality of the semiconductor.

Career Highlights

Huang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to push the boundaries of semiconductor technology and contribute to the development of advanced electronic components.

Collaborations

Throughout his career, Huang has collaborated with notable colleagues, including Su-Hao Liu and Lun-Kuang Tan. These partnerships have fostered innovation and have been instrumental in the successful development of his patented technologies.

Conclusion

Jie-Huang Huang is a key figure in semiconductor innovation, with a focus on enhancing semiconductor structures. His contributions have significantly impacted the field, and his patents reflect his commitment to advancing technology.

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