Company Filing History:

8 out of 164,108

International Business Machines Corporation

where one patent can have more than one assignee

Years Active: 2012-2019

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9 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 10374042 - Semiconductor device including epitaxially formed buried channel region (2019-08-06),

2. 9679969 - Semiconductor device including epitaxially formed buried channel region (2017-06-13),

3. 9639652 - Compact model for device/circuit/chip leakage current (IDDQ) calculation including process induced uplift factors (2017-05-02),

4. 9595598 - Semiconductor device including epitaxially formed buried channel region (2017-03-14),

5. 9590106 - Semiconductor device including epitaxially formed buried channel region (2017-03-07),

6. 8959008 - Method for dynamically switching analyses and for dynamically switching models in circuit simulators (2015-02-17),

7. 8626480 - Compact model for device/circuit/chip leakage current (IDDQ) calculation including process induced uplift factors (2014-01-07),

8. 8298897 - Asymmetric channel MOSFET (2012-10-30),

9. 8237197 - Asymmetric channel MOSFET (2012-08-07),

Title: The Innovative Contributions of Jie Deng

Introduction

Jie Deng is a prominent inventor based in Wappingers Falls, NY (US), known for his significant contributions to the field of semiconductor technology. With a total of nine patents to his name, he has made remarkable advancements that have influenced the industry.

Latest Patents

Among his latest patents is a semiconductor device that includes an epitaxially formed buried channel region. This innovative device features at least one semiconductor fin on the upper surface of a substrate. The semiconductor fin comprises a channel region situated between opposing source and drain regions. A gate stack is positioned on the upper surface of the substrate, wrapping around the sidewalls and upper surface of only the channel region. Notably, the channel region is a dual channel region that includes both a buried channel portion and a surface channel portion, which completely surrounds the buried channel.

Career Highlights

Jie Deng has had a distinguished career, working with leading companies in the technology sector. He has been associated with International Business Machines Corporation (IBM) and Globalfoundries Inc., where he has played a crucial role in developing cutting-edge semiconductor technologies.

Collaborations

Throughout his career, Jie has collaborated with talented professionals, including Jae-Eun Park and Pranita Kerber. These collaborations have fostered innovation and contributed to the successful development of various semiconductor devices.

Conclusion

J

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