Company Filing History:

5 out of 12,867

Advanced Micro Devices Corporation

patents

4 out of 10,295

Tokyo Electron Limited

Years Active: 2007-2017

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12 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 9818816 - Metal capacitor design for improved reliability and good electrical connection (2017-11-14),

2. 8357584 - Metal capacitor design for improved reliability and good electrical connection (2013-01-22),

3. 8089125 - Integrated circuit system with triode (2012-01-03),

4. 7989891 - MOS structures with remote contacts and methods for fabricating the same (2011-08-02),

5. 7807213 - Method and system for characterizing porous materials (2010-10-05),

6. 7670932 - MOS structures with contact projections for lower contact resistance and methods for fabricating the same (2010-03-02),

7. 7576357 - System for characterization of low-k dielectric material damage (2009-08-18),

8. 7553769 - Method for treating a dielectric film (2009-06-30),

9. 7355201 - Test structure for measuring electrical and dimensional characteristics (2008-04-08),

10. 7345000 - Method and system for treating a dielectric film (2008-03-18),

11. 7271047 - Test structure and method for measuring the resistance of line-end vias (2007-09-18),

12. 7238382 - Method and system for characterizing porous materials (2007-07-03),

Title: Innovations of Jianhong Zhu

Introduction

Jianhong Zhu is a prominent inventor based in Austin, Texas, known for his significant contributions to the field of electrical engineering. With a total of 12 patents to his name, he has made remarkable advancements in capacitor design, enhancing both reliability and electrical connectivity.

Latest Patents

One of Jianhong Zhu's latest patents focuses on a metal capacitor design that improves reliability and ensures good electrical connection. This innovative design features a first layer of alternating metal lines, a second layer of additional metal lines, and a dielectric layer positioned between these layers. The design incorporates vias that connect the metal lines, allowing for enhanced conductivity and reliability. The unique structure maintains the spacing between metal lines while increasing the spacing between vias and metal, ultimately improving the overall performance of the capacitor.

Career Highlights

Throughout his career, Jianhong Zhu has worked with notable companies such as Advanced Micro Devices Corporation and Tokyo Electron Limited. His experience in these organizations has contributed to his expertise in developing cutting-edge technologies in the semiconductor industry.

Collaborations

Jianhong Zhu has collaborated with esteemed colleagues, including David Donggang Wu and Dorel Ioan Toma, further enriching his professional journey and fostering innovation in his projects.

Conclusion

Jianhong Zhu's work exemplifies the spirit of innovation in electrical engineering, particularly through his advancements in capacitor design. His contributions continue to influence the industry and inspire future developments.

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